Fine-line plasma-enhanced processes on the basis of a set of pilot units with a scalable inductively coupled plasma source for use in microelectronics

An approach to the design of industrial-scale plasma processing techniques to meet the demands of modern micro-and nanoelectronics is discussed. Industrial plasma processing technology and equipment are considered as a single whole. This concept is implemented in a set of pilot plasma processing units based on a high-density plasma source. This set includes plasma etching, plasma-assisted dielectric deposition, and plasma immersion ion implantation units. The units are automated and equipped with in situ monitoring means.