Hydrogen incorporation, stability, and release effects in thin film silicon

Thin film silicon (amorphous silicon, microcrystalline silicon) contains typically about 10 at.% of hydrogen. Several hydrogen effects in connection with hydrogen incorporation, hydrogen diffusion/stability, and hydrogen release have been observed and are reviewed with focus on the experimental techniques of infrared absorption, hydrogen diffusion, and effusion measurements. Hydrogen effects in hydrogen‐implanted amorphous, microcrystalline, and crystalline silicon materials are also discussed. The knowledge and the understanding of these effects may help for improved products and is, furthermore, a challenging scientific task.