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February 22, 1988Applied Physics Letters

Low-temperature reactive ion etching and microwave plasma etching of silicon

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Authors

STS. TachiHitachi High-Tech (Japan)KTKazunori TsujimotoKubota (Japan)SOSadayuki OkudairaHitachi (Japan)

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Tachi et al. (1988) studied this question.

synapsesocial.com/papers/69fd3db754949f8cfd5d1b84https://doi.org/10.1063/1.99382
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