The biannual SEMATECH Litho Forum was held May 12-14, 2008 in Bolton Landing, NY, not far from SEMATECH's facility at Albany Nanotech. This biannual meeting is designed to assess the progress in advanced patterning technology and to produce consensus about the processes that will be used to manufacture the next generations of devices. A summary of the key ideas presented at the meeting is given in this paper, along with the future challenges and opportunities in emerging lithographic technologies.
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Willson et al. (2008) studied this question.
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