High-performance monolayer MoS2 nanosheet GAA transistor

Abstract In this article, a 0.7 nm thick monolayer MoS 2 nanosheet gate-all-around field effect transistors (NS-GAAFETs) with conformal high- κ metal gate deposition are demonstrated. The device with 40 nm channel length exhibits a high on-state current density of ~410 μ A μ m −1 with a large on/off ratio of 6 × 10 8 at drain voltage = 1 V. The extracted contact resistance is 0.48 ± 0.1 kΩ μ m in monolayer MoS 2 NS-GAAFETs, thereby showing the channel-dominated performance with the channel length scaling from 80 to 40 nm. The successful demonstration of device performance in this work verifies the integration potential of transition metal dichalcogenides for future logic transistor applications.