Key points are not available for this paper at this time.
The authors investigated the dielectric constant change of Hf(1−x)SixO2 film as functions of Si concentration and annealing temperature. As a result, the dielectric constant of Hf(1−x)SixO2 was increased when doped with a small amount of Si after 800°C annealing. The authors revealed that the dielectric constant enhancement of Hf(1−x)SixO2 films is related to the phase transformation from the monoclinic to the tetragonal phase of HfO2. By using the Clausius-Mossotti relation, it is concluded that the dielectric constant enhancement through the structural phase transformation is derived from the molar volume shrinkage rather than the molar polarizability increase.
Tomida et al. (Mon,) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: