Heterogeneous Local-Epitaxial Growth Behavior of Ultrathin HfO ₂ /Al-Doped TiO ₂ Bilayer Dielectrics for Dynamic Random-Access Memory Capacitor Applications

Dae Seon Kwon; Kun Hee Ye; In Soo Lee; Jonghoon Shin; Junil Lim; Tae Kyun Kim; Haengha Seo; Heewon Paik; Haewon Song; Seungheon Choi; Jung-Hae Choi; Cheol Seong Hwang

doi:10.1021/acsami.6c04008

June 6, 2026ACS Applied Materials & Interfaces

Heterogeneous Local-Epitaxial Growth Behavior of Ultrathin HfO ₂ /Al-Doped TiO ₂ Bilayer Dielectrics for Dynamic Random-Access Memory Capacitor Applications

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Key Points

The research aims to understand the growth behavior and interfacial characteristics of HfO2/Al-doped TiO2 bilayer dielectrics.
Utilized systematic experimental techniques to analyze growth behavior and interfacial properties.
Focused on epitaxial growth conditions to evaluate dielectric characteristics.
Characterized electrical properties relevant to dynamic random-access memory capacitor applications.
Identified heterogeneous growth patterns affecting the dielectric properties.
Demonstrated improved interfacial stability under specific growth conditions.
Found potential routes for optimizing capacitance in memory applications.

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Implication

Systematic examination reveals growth behavior and interfacial properties of HfO2/Al-Doped TiO2 bilayers in memory applications, suggesting optimization routes.

Abstract

This study systematically examines the growth behavior and interfacial properties of a HfO

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Kwon et al. (2026) studied this question.

synapsesocial.com/papers/6a265c42ad53cfb9357c57ca https://doi.org/10.1021/acsami.6c04008

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Heterogeneous Local-Epitaxial Growth Behavior of Ultrathin HfO ₂ /Al-Doped TiO ₂ Bilayer Dielectrics for Dynamic Random-Access Memory Capacitor Applications

Key Points

No abstract yet

Implication

Abstract

Discussion

Cite This Study

Heterogeneous Local-Epitaxial Growth Behavior of Ultrathin HfO ₂ /Al-Doped TiO ₂ Bilayer Dielectrics for Dynamic Random-Access Memory Capacitor Applications

Key Points

No abstract yet

Implication

Abstract

Discussion

Cite This Study

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