Metal-insulator transition at low densities in a two-dimensional low-bandgap semiconductor

and contact resistances as low as 1.31 kΩ·μm at 1.5 K. These characteristics enable a gate-tunable metal-insulator transition at carrier densities down to 2.75 × 10¹⁰ cm⁻². Transport in this regime is dominated by electron-electron interactions, as supported by finite-temperature scaling. Below 50 K, however, an additional disorder-related energy scale emerges, consistent with percolation. These results demonstrate that disorder remains relevant even in high-mobility devices, challenging a purely interaction-driven transition in two-dimensional systems.