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June 1, 1999Surface Review and Letters

ATOMIC LAYER DEPOSITION OF SiO2 USING CATALYZED AND UNCATALYZED SELF-LIMITING SURFACE REACTIONS

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Authors

JKJ. W. KlausNorwegian Institute of Bioeconomy ResearchOSOfer SnehSundew Technologies (United States)AOA. W. OttNorthwestern University

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Klaus et al. (1999) studied this question.

synapsesocial.com/papers/6a3426aecce949c3f40e993dhttps://doi.org/10.1142/s0218625x99000433
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