Sustainable AFM-Based Nanolithography on Chitosan Thin Films for 2.5D and 3D Nanostructure Fabrication

The growing request for more sustainable materials and environmentally friendly nanofabrication methods in the electronics field has recently driven the scientific community in the development of bio-derived materials as an alternative to conventional lithographic resists. In this work, we used chitosan, a biodegradable and biocompatible polysaccharide, as a green direct-write resist material for Atomic Force Microscopy-based nanolithography. Chitosan thin layers were obtained by spin coating and systematically characterized, in terms of thickness and surface roughness, demonstrating nanoscale smoothness and tunable film thickness. Three Pulse–Atomic Force Lithography (P-AFL) approaches, i.e., Constant Pulse, Gradient Pulse, and Raster Pulse AFL methods, were used to pattern nanostructures with constant-depth nanogrooves, variable-depth (2.5D) profile, and three-dimensional nanoholes on chitosan films. The results reveal high pattern fidelity, reproducibility, and tunability of feature dimensions as a function of applied force and scanning direction. Moreover, the RP-AFL technique enabled the fabrication of well-defined 3D nanostructures with depths matching the film thickness, which is a prerequisite for subsequent pattern transfer. This experimental work provided a first proof-of-concept to adopt chitosan as a more sustainable alternative with respect to conventional resists. Moreover, the results highlight P-AFL methods as a versatile and low-impact nanofabrication strategy, contributing to the development of greener micro- and nano-manufacturing technologies.