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The details of MOCVD growth of lattice-matched (0.74 eV) and lattice-mismatched (0.55 eV and 0.6 eV) InGaAs-based thermophotovoltaic (TPV) devices on InP substrates are discussed. The optimization of growth conditions, structural parameters and run-to-run consistency have played a key role in the development of high quality TPV devices, particularly in the development of lattice-mismatched materials.
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Murray et al. (2003) studied this question.
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