Loss of electrical conductivity in boron-doped diamond due to ion-induced damage

The response of B-ion-implanted type-IIa diamond to light ion (H, He) irradiation is investigated by monitoring the sample resistance as a function of dose. It is found that the resistivity of the layer increases rapidly with increasing dose, and reaches the resistivity of the undoped diamond for irradiation doses much less than those required for the onset of damage related electrical conductivity in pristine diamond. It is shown that defects created by the nuclear stopping process act as compensating centers for the B acceptors. The present findings are of importance for the design of radiation hard diamond based electronic devices and suggests a method for the isolation of B-doped devices on a diamond chip. The results of the present work also explain why the collection distance in intrinsic nondoped diamond radiation detectors actually increases with increasing ion dose.