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January 1, 1976Radiation Effects

Influence of thermal history on the residual disorder in implanted silicon

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Authors

LCL. CsepregiFraunhofer SocietyWCW. K. ChuHeilongjiang UniversityHMHelmut MüllerUniversity of Stuttgart

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Csepregi et al. (1976) studied this question.

synapsesocial.com/papers/6a6f2e4375498292b7089528https://doi.org/10.1080/00337577608237443
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  1. 1On the annealing of damage produced by copper ion implantation of silicon single crystals1974 · 10 citations
  2. 2Channeling ion implantation through palladium films1975 · 4 citations