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September 1, 1980IEEE Transactions on Magnetics

Facing targets type of sputtering method for deposition of magnetic metal films at low temperature and high rate

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Authors

MNM. NaoeTokyo Institute of TechnologySYS. YamanakaKansai UniversityYHY. HoshiTokyo Polytechnic University

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Naoe et al. (1980) studied this question.

synapsesocial.com/papers/6a6f4dac31a3df824327b4fahttps://doi.org/10.1109/tmag.1980.1060683
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