What question did this study set out to answer?

Develop a batch-fabrication method to produce thin-film magnetic recording heads with narrow, vertical-walled gaps in Permalloy films without the undercutting problems of chemical etching.

September 1, 1970IEEE Transactions on Magnetics

Batch-fabricated thin-film magnetic recording heads

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Authors

LRL. T. RomankiwIBM Research - Thomas J. Watson Research Center ICIan M. CrollPacific University MHM. HatzakisBellevue College

Discussion

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Implication

Engineering investigation demonstrates batch fabrication of two-micrometer recording head gaps in permalloy films, indicating improved precision in magnetic storage device production.

Key Points

Develop a batch-fabrication method to produce thin-film magnetic recording heads with narrow, vertical-walled gaps in Permalloy films without the undercutting problems of chemical etching.
Combined photoetching, electron beam exposure, and electroplating techniques to build thin-film head structures.
Patterned 2-μm wide strips using electron-sensitive resist exposed by an electron beam.
Electroplated 2.5-μm thick Permalloy films onto both sides of the patterned resist strip.
Successfully produced thin-film recording heads featuring 2-μm wide gaps in 2.5-μm thick Permalloy films.
Achieved narrow gaps with vertical walls, overcoming previous chemical etching limits caused by undercutting.

Cite This Study

Romankiw et al. (1970) studied this question.

synapsesocial.com/papers/6a6f85eafebe604dd7086dc9 https://doi.org/10.1109/tmag.1970.1066881

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September 1, 1970IEEE Transactions on Magnetics

Batch-fabricated thin-film magnetic recording heads

View Full Paper

Ask AI

Bookmark

Authors

LRL. T. RomankiwIBM Research - Thomas J. Watson Research Center ICIan M. CrollPacific University MHM. HatzakisBellevue College

Discussion

Member takes

Implication

Engineering investigation demonstrates batch fabrication of two-micrometer recording head gaps in permalloy films, indicating improved precision in magnetic storage device production.

Key Points

Develop a batch-fabrication method to produce thin-film magnetic recording heads with narrow, vertical-walled gaps in Permalloy films without the undercutting problems of chemical etching.
Combined photoetching, electron beam exposure, and electroplating techniques to build thin-film head structures.
Patterned 2-μm wide strips using electron-sensitive resist exposed by an electron beam.
Electroplated 2.5-μm thick Permalloy films onto both sides of the patterned resist strip.
Successfully produced thin-film recording heads featuring 2-μm wide gaps in 2.5-μm thick Permalloy films.
Achieved narrow gaps with vertical walls, overcoming previous chemical etching limits caused by undercutting.

Cite This Study

Romankiw et al. (1970) studied this question.

synapsesocial.com/papers/6a6f85eafebe604dd7086dc9 https://doi.org/10.1109/tmag.1970.1066881

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