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Conditions required for in situ growth of YBaCuO thin films by reactive electron-beam evaporation have been explored. Three sources of activated oxygen (atomic oxygen from microwave discharge, plasma generated by electron beams, and an ion beam) were compared. The best results so far were obtained with atomic oxygen. Epitaxial films with high critical currents were grown on SrTiO/sub 3/ [100] and [110], Al/sub 2/O/sub 3/ (1102), and MgO [100] at 600 degrees C. Evaporation rates were controlled with a rate monitor using atomic absorption.>
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Missert et al. (1989) studied this question.
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