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January 1, 1985Journal of Applied Physics

Characteristics of submicron patterns fabricated by gallium focused-ion-beam sputtering

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Authors

HMHiroaki MorimotoRailway Technical Research InstituteYSY. SasakiFujifilm (Japan)YWYaichiro WatakabeMitsubishi Electric (Japan)

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Morimoto et al. (1985) studied this question.

synapsesocial.com/papers/6a6fbcb0f44fa9f079dd373bhttps://doi.org/10.1063/1.335387
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