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November 6, 1995Applied Physics Letters

Deposition of extremely thin (Ba,Sr)TiO3 thin films for ultra-large-scale integrated dynamic random access memory application

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Authors

CHCheol Seong HwangTokyo Institute of TechnologySPSoon Oh ParkInha UniversityHCHag‐Ju ChoSamsung (South Korea)

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Cite This Study

Hwang et al. (1995) studied this question.

synapsesocial.com/papers/6a6fcb5326770c2b8de02bdahttps://doi.org/10.1063/1.114795
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