Making GaAs integrated circuits

Digital gallium arsenide (GaAs) integrated circuits offer prospects for high-performance electronics, particularly for increased speed and radiation hardness. Prototype GaAs devices fabricated in technologies ranging from ion-implanted metal semiconductor field-effect transistors (MESFETs) and junction field-effect transistors (JFETs) to epitaxial heterostructures, such as high-electron-mobility transistors (HEMTs) and heterojunction bipolar transistors (HBTs), have demonstrated these advantages. While these GaAs technologies share many common fabrication features, the unique characteristics of each and GaAs materials present significant manufacturing challenges. It is argues that to produce real integrated circuits (ICs) for system applications, the disciplines and rigors of a production environment as well as the innovations of research and development are required.>