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November 1, 1992Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Energy resolved angular distribution of argon ions at the substrate plane of a radio frequency plasma reactor

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Authors

JJJoachim JanesFraunhofer Institute for Silicon TechnologyCHChristoph HuthFraunhofer Institute for Microengineering and Microsystems

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Janes et al. (1992) studied this question.

synapsesocial.com/papers/6a707047febe604dd70939e5https://doi.org/10.1116/1.577779
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