Removal of the Chlorofluorocarbon 1,1,2-Trichloro-1,2,2-Trifluoroethane in Gas by a Corona-Discharge Reactor

Two types of corona-discharge reactors, a deposition-type reactor in which negative ions deposit at the anode and a wetted-wall reactor in which negative ions are absorbed into a liquid film on the anode, are applied to removals of C 2 F 3 Cl 3 . By the deposition-type reactor, the removal efficiency from N 2 increases with the decrease of the inlet concentration, suggesting that this reactor can be applied to remove extremely low concentrations of C 2 F 3 Cl 3 . When the C 2 F 3 Cl 3 concentration is high, there is an optimum concentration of coexisting H 2 O to give the maximum removal efficiency. When O 2 is mixed, the removal efficiency decreases. The removal mechanism is discussed on the basis of dissociative electron attachment, radical reaction, and particle formation. When the C 2 F 3 Cl 3 concentration is high, the wetted-wall reactor shows a higher removal efficiency than the deposition-type reactor. On the other hand, when the C 2 F 3 Cl 3 concentration is low, the result is opposite.