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September 15, 1985Journal of Applied Physics

Effects of frequency on optical emission, electrical, ion, and etching characteristics of a radio frequency chlorine plasma

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Authors

VDVincent M. DonnellyUniversity of HoustonDFDaniel FlammS&F Systemtechnik (Germany)RBRichard H. BrucePalo Alto Research Center

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Donnelly et al. (1985) studied this question.

synapsesocial.com/papers/6a7095d331a3df824328d66ahttps://doi.org/10.1063/1.335978
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