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May 1, 1986Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Laser diagnostics of a silane plasma—SiH radicals in an a-Si:H chemical vapor deposition system

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Authors

YMYutaka MatsumiNagoya Industrial Science Research InstituteTHT. HayashiSony (Taiwan)HYHiromichi YoshikawaKyocera (United States)

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Matsumi et al. (1986) studied this question.

synapsesocial.com/papers/6a70969af44fa9f079de4166https://doi.org/10.1116/1.573938
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