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November 1, 1980Journal of Vacuum Science and Technology

Emission spectroscopy of glow-discharge and sputtering plasmas used in amorphous Si:H film deposition

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Authors

MPM. A. PaeslerNorth Carolina State UniversityTOTeppei OkumuraJapan Aerospace Exploration AgencyWPWilliam PaulUniversity of London

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Paesler et al. (1980) studied this question.

synapsesocial.com/papers/6a70969bfebe604dd7095c09https://doi.org/10.1116/1.570665
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