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October 1, 1985Japanese Journal of Applied Physics

Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

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Authors

TMTadatsugu MinamiKanazawa Institute of TechnologyHSHirotoshi SatoGifu UniversityHNHidehito NantoKanazawa Institute of Technology

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Minami et al. (1985) studied this question.

synapsesocial.com/papers/6a711dff78a11c550e0b2b84https://doi.org/10.1143/jjap.24.l781
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  4. 4Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic field1982 · 192 citations
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