A theoretical model is proposed to explain the mechanism of the formation of sputter-deposited ’’planarized glass’’; a phenomenon which describes the topography change during sputter glass deposition on top of a metal strip when sufficient bias is applied to the substrate target, and the sputter-deposited ’’standard glass’’ when little or not bias is applied to the substrate target. By assuming that the deposition rate is independent of the substrate topology, and that the removal rate is a function of the slope angle of the substrate surface, it is able to explain the various experimental phenomena observed for both ’’planarized glass’’ and ’’standard glass’’. A delineation scheme is adopted to support the model by displaying the glass contour step-by-step in formation of both kinds of sputter-deposited glass.
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Ting et al. (1978) studied this question.