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September 1, 2006Journal of Applied Physics

High-K dielectrics for the gate stack

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Authors

JLJean‐Pierre LocquetKU LeuvenCMChiara MarchioriKarlstad UniversityMSM. SousaIBM Research - Zurich

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Locquet et al. (2006) studied this question.

synapsesocial.com/papers/6a72091b2163a0a01bc5e77ehttps://doi.org/10.1063/1.2336996
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