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June 1, 1994Japanese Journal of Applied Physics

RuO2 Thin Films as Bottom Electrodes for High Dielectric Constant Materials

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Authors

KYK. YoshikawaTKTakafumi KimuraJapanese Red Cross Society, JapanHNHideyuki NoshiroFujitsu (Japan)

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Cite This Study

Yoshikawa et al. (1994) studied this question.

synapsesocial.com/papers/6a724eb8a528af2d65c460dfhttps://doi.org/10.1143/jjap.33.l867
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