We report on a hydrogenated amorphous silicon (a-Si:H) p-i-n solar cell having a conversion efficiency of 10.50 percent (1.05-cm2area). The cell was prepared by a conventional plasma-enhanced chemical vapor deposition process using a structure back electrode n-i-p/SnO2-ITO/glass. This conversion efficiency was obtained from the reduction and control of impurity levels in the i-layer. Photovoltaic characteristics of prepared cells were measured under AMI (100 mW/cm2). The impurity levels of oxygen and boron were measured by SIMS and are discussed.
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Yamazaki et al. (1984) studied this question.