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July 8, 2002Applied Physics Letters

Chemical interaction between atomic-layer-deposited HfO2 thin films and the Si substrate

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Authors

MCMoonju ChoMicron (United States)JPJaehoo ParkSeoul National UniversityHPHong Bae ParkKyungpook National University

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Cho et al. (2002) studied this question.

synapsesocial.com/papers/6a72ac77b5c1fe5ca9e002ebhttps://doi.org/10.1063/1.1492320
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