Leakage current mechanism in sub-micron polysilicon thin-film transistors

We have studied leakage current in sub-micron p-channel polysilicon thin-film-transistor. Our study revealed that thermionic emission is the dominant mechanism at low drain bias (-0.1 V) while thermionic field emission dominate at moderately high drain bias. At high drain bias (>-5.0 V), tunneling was observed to be the dominant leakage mechanism.