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May 1, 1991Journal of Applied Physics

Deposition of device quality, low H content amorphous silicon

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Authors

AMA. H. MahanNational Renewable Energy LaboratoryJCJ. J. CarapellaNational Renewable Energy LaboratoryBNB. P. NelsonElon University

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Mahan et al. (1991) studied this question.

synapsesocial.com/papers/6a7574b496d04a2f43f59df0https://doi.org/10.1063/1.348897
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