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This letter reports high performance AlGaN solar-blind avalanche photodiodes (APDs) with separate absorption and multiplication structure grown by metal-organic chemical vapor deposition on AlN templates. In fabricating APD devices, we applied a photo-electrochemical treatment process after mesa etching to reduce damage induced by etching. After introducing this process, the leakage current of the fabricated devices was reduced obviously and a record-high gain of 1.2×104at the reverse bias of 84 V was achieved under the measurement condition with the protection current constrained to 10-5A.
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Shao et al. (2014) studied this question.
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