The flow ratio during generation by dielectric barrier discharge has a large impact on the atomic layer deposition (ALD) of metal oxides in a hot wall ALD reactor. For ALD using as a metal precursor, a higher growth per cycle and a broader ALD temperature window are obtained when is added to the supply of the generation. A positive impact of in the generation is also observed for and ALD. A negative impact is observed for ALD: The thickness is reduced for those conditions for where ALD is enhanced.
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Delabie et al. (2010) studied this question.
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