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November 1, 1999Applied Physics Letters

Fabrication of transparent p–n heterojunction thin film diodes based entirely on oxide semiconductors

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Authors

AKAtsushi KudoTokyo Institute of TechnologyHYHiroshi YanagiTakeda (Japan)KUKazushige UedaKyushu Institute of Technology

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Kudo et al. (1999) studied this question.

synapsesocial.com/papers/6a7880fdf574d2d021f6d75chttps://doi.org/10.1063/1.125171
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