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May 19, 2006Journal of Micromechanics and Microengineering

Development of a low temperature MEMS process with a PECVD amorphous silicon structural layer

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SCStella ChangSSSiva SivoththamanUniversity of Waterloo

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Chang et al. (2006) studied this question.

synapsesocial.com/papers/6a79520377336a1bae023dadhttps://doi.org/10.1088/0960-1317/16/7/027
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