The electrical properties of GaP are examined using Schottky barrier capacitance techniques Mercury is used as the contacting metal and is successfully applied to homogeneously doped n-type material with carrier concentrations in the region of 3 × 1017 cm−3 and to zinc-diffused p-type material with non-homogeneous carrier distributions ranging from 4 × 1018 to 1.2 × 1019 cm−3. The atom concentration profiles of the diffused samples are determined using radiotracer analysis. A simple analogue system is devised to facilitate the CU measurements. Current-voltage measurements on the n-type material indicate that the n-criterion for capacitance profiling is not usefully applicable to this system, and lead to some conclusions regarding the ideality of diodes used for this technique. The acceptor concentrations of the p-type material are less than the corresponding atom concentrations, and possible causes of this discrepancy are discussed.
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Jay et al. (1978) studied this question.
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