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January 15, 1982Applied Physics Letters

Zone-melting recrystallization of encapsulated silicon films on SiO2—morphology and crystallography

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Authors

MGM. W. GeisMIT Lincoln LaboratoryHSHenry I. SmithLumArray (United States)BTB-Y. TsaurMIT Lincoln Laboratory

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Geis et al. (1982) studied this question.

synapsesocial.com/papers/6a7d1450469c795fc4278b58https://doi.org/10.1063/1.93021
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  3. 3n-channel deep-depletion metal-oxide-semiconductor field-effect transistors fabricated in zone-melting-recrystallized polycrystalline Si films on SiO21981 · 24 citations
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