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September 1, 1982Journal of Vacuum Science and Technology

Simulation of plasma-assisted etching processes by ion-beam techniques

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Authors

TMT. M. MayerSandia National LaboratoriesRBR. A. BarkerBirthingway College of Midwifery

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Mayer et al. (1982) studied this question.

synapsesocial.com/papers/6a7d7b15e0417bf78327cd15https://doi.org/10.1116/1.571821
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