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February 1, 1978Applied Physics Letters

Laser annealing of boron-implanted silicon

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Authors

RYR. T. YoungOak Ridge National LaboratoryCWC. W. WhiteColorado School of MinesGCG. J. ClarkUniversity of Oxford

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Young et al. (1978) studied this question.

synapsesocial.com/papers/6a7e52aa760ccf6bd0991013https://doi.org/10.1063/1.89959
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