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Low Voltage Operation of High-κ HfO2/TiO2/Al2O3 Single Quantum Well for Nanoscale Flash Memory Device Applications, Maikap, Siddheswar, Wang, Ting-Yu, Tzeng, Pei-Jer, Lee, Heng-Yuan, Lin, Cha-Hsin, Wang, Ching-Chiun, Lee, Lurng-Shehng, Yang, Jer-Ren, Tsai, Ming-Jinn
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Maikap et al. (2008) studied this question.
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