The enhanced electron injection of silicon-rich oxide (SRO)/SiO2 interfaces is explained. We find an excellent fit to the current-voltage characteristics of these interfaces by calculating the field enhancement over the surface of oblate spheroids in a uniform applied field. This explains why field enhancement at SRO/SiO2 interfaces tends to be independent of island size and unaffected by annealing.
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Chang et al. (1986) studied this question.