This paper reviews the research literature that has appeared since 1980 on computer calculations of current distribution in the field of electrodeposition. Key contributions and general trends are identified, with particular emphasis given to applications in the electronics industry. The survey reveals how numerical models have provided the technology of electrodeposition with general understanding, predictive power, and the capability of optimizing deposit uniformity. Anticipated developments for the nineties are discussed.
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John Dukovic (1990) studied this question.
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