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May 1, 1990Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2

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Authors

JCJohn E. CrowellUniversity of California, San DiegoLTLaura L. TedderUniversity of Colorado BoulderHCHee-Chuen ChoUniversity of California, San Diego

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Crowell et al. (1990) studied this question.

synapsesocial.com/papers/6a830262a353bb944193c4c5https://doi.org/10.1116/1.576817
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