Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
January 1, 1975Journal of Vacuum Science and Technology

Electron mean escape depths from x−ray photoelectron spectra of thermally oxidized silicon dioxide films on silicon

View Full Paper
Ask AI
Bookmark
Share

Authors

RFR. FlitschIBM (United States)SRS. I. RaiderIBM Research - Thomas J. Watson Research Center

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Flitsch et al. (1975) studied this question.

synapsesocial.com/papers/6a830842c4b5dbf8331f276chttps://doi.org/10.1116/1.568771
View Full Paper
Ask AI
Bookmark
Share