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A high capacitance density (C/sub density/) metal-insulator-metal (MIM) capacitor with niobium pentoxide (Nb2O5) whose k value is higher than 40, is developed for integrated RF bypass or decoupling capacitor application. Nb2O5MIM with HfO2/Al2O3barriers delivers a high C/sub density/ of >17 fF/μm2with excellent RF properties, while maintaining comparable leakage current and reliability properties with other high-k dielectrics. The capacitance from the dielectric is shown to be stable up to 20 GHz, and resonant frequency of 4.2 GHz and Q of 50 (at 1 GHz) is demonstrated when the capacitor is integrated using Cu-BEOL process.
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Kim et al. (2005) studied this question.
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