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July 1, 1986IEEE Electron Device Letters

Ion implanted contacts to a-Si:H thin-film transistors

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Authors

HBH.F. BareHanscom Air Force BaseGNG.W. NeudeckPurdue University West Lafayette

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Cite This Study

Bare et al. (1986) studied this question.

synapsesocial.com/papers/6a838831daf812a7fbcd7d9ahttps://doi.org/10.1109/edl.1986.26426
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Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Interaction between n-type amorphous hydrogenated silicon films and metal electrodes1982 · 33 citations
  2. 2On the quality of contacts in a-Si:H staggered electrode thin-film transistors1985 · 29 citations
  3. 3The effects of ion implantation on the electrical properties of amorphous silicon1980 · 92 citations
  4. 4Thin film transistors for large area electronics1984 · 44 citations