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Titanium oxide thin film could be prepared from (NH4)2TiF6 aqueous solution with addition of boric acid by Liquid Phase Deposition (LPD) process. The aspect and chemical composition of the deposited films were different according to the concentration range of (NH4)2TiF6 and H3BO3 in the treatment solution. The deposition rate of transparent TiO2 film increased with increasing concentration of added H3BO3.
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Deki et al. (1996) studied this question.
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