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The dynamics of the catastrophic optical damage process under continuous wave operation is analyzed in red-emitting high-power diode lasers by means of combined thermal and optical near-field (NF) imaging with cameras. The catastrophic process is revealed as extremely fast (Δt⩽2.3ms) and spatially confined. It is connected with a pronounced impulsive temperature change. Its coincidence with the most intense NF filament is indicative of the critical nature of thermal runaway in the catastrophic process.
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Ziegler et al. (2008) studied this question.
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