Near-threshold sputtering mechanisms from a computer simulation of argon- bombarded clean and oxygen-reacted copper single crystals

Normal incidence argon-copper sputtering mechanisms have been investigated for ion energies just above threshold. Identical mechanisms operate in both the (111) and (001) surface orientations. Adsorption of an ordered oxygen overlay on the surface does not destroy the ejection processes. Although the mechanisms produce similar ejected atom energy distributions, the processes may be experimentally distinguishable through the angular emission spectrum of the ejected copper atoms.